DAS Environmental Experts launches ALCEA for semiconductor NOx abatement

DAS Environmental Expert GmbH has launched ALCEA, a retrofit-ready secondary abatement system for semiconductor fabs that can cut nitrogen oxide emissions by up to 95% while reducing floor-space and utility demand. The company will showcase the system at SEMICON Taiwan 2026 in Taipei, highlighting a compact approach to post-combustion DeNOx treatment for existing and new fab installations.

Why it matters: - Semiconductor fabs need to control emissions without adding pressure to crowded subfab areas. - ALCEA is designed to reduce NOx while keeping floor-space use, energy demand and maintenance needs low. - The system targets both new and existing fab installations, which could make emissions upgrades easier to deploy.

What happened: - DAS Environmental Expert GmbH launched ALCEA, a secondary abatement solution for nitrogen oxide emissions in semiconductor manufacturing. - The company will present ALCEA at SEMICON Taiwan 2026 from Sept. 2 to 4 at TaiNEX 1 and 2 in Taipei, Booth J2 | 346. - The system is installed downstream of NOx-generating waste gas treatment units.

The details: - ALCEA can reduce NOx by up to 95%. - The catalyst stage is integrated directly into the exhaust duct instead of being installed as a separate floor-standing unit. - The design is intended to minimize additional floor space in the subfab. - The solution is built for retrofitting into existing exhaust systems. - ALCEA can be used downstream of different NOx-generating abatement technologies. - The system is based on DAS Environmental Experts’ plasma-enhanced Catalytic Technology. - Reactive oxygen species are formed and drive reactions on the catalyst surface. - The process converts NOx into more highly oxidized, water-soluble nitrogen compounds. - Those compounds can then be removed in a downstream central wet abatement system. - The dry-oxidation process requires no special gas injection. - The catalysts are reusable. - Depending on NOx concentration, prior treatment and plasma power, ALCEA handles volume flows of up to 5,000 standard liters per minute. - Specified power consumption is up to 3.2 kW, depending on NOx concentration. - The system supports up to two catalyst ducts for dual systems or two individual local scrubbers. - Process cooling water, reusable catalysts and a low-maintenance design are intended to support ongoing fab operations. - ALCEA was developed with Industrial Technology Research Institute, Taiwan’s applied-technology research institute. - DAS Environmental Experts’ engineering team in Taiwan played a central role in development.

Between the lines: - The launch expands DAS Environmental Experts’ waste gas treatment portfolio with a compact post-combustion DeNOx option. - The emphasis on retrofits suggests the company is aiming at fabs that need emissions upgrades without major facility redesigns. - The Taiwan development partnership and local engineering role point to a product strategy built around regional customer access and applied research.

What's next: - Visitors to SEMICON Taiwan 2026 can learn more about ALCEA and DAS Environmental Experts’ broader waste gas and wastewater treatment portfolio. - The company is positioning ALCEA for deployment across both new builds and existing fab exhaust systems. - DAS Environmental Experts will continue highlighting regional innovation and local value creation through its Taiwan team.

The bottom line: - ALCEA gives semiconductor fabs a compact NOx treatment option that aims to cut emissions without taking up much subfab space or adding major utility burden. - More information